HIT battery manufacturing process

　　PECVD Legal Preparation A-SI: H film uses rich active particles in plasma for low-temperature deposition has always been an important method for preparing A-SI: H. In the vacuum state, the gas field is applied to the gas, and the gas provided by the gas will be transformed into a plasma state under the energy provided by the electric field. It contains a large number of active particles such as electronics, ions, photons, and various free radicals. Plashes are part of ionized gases. Compared with ordinary gas, the main nature has undergone essential changes and is a new material gathering state. The substrate placed in the plasma can be kept at room temperature, and the electrons will get enough energy (2-5EV) under the stimulation of the power plant, which will be ionized by the collision with the molecules. The disadvantages of PECVD are manifested in two aspects. One is its instability, and the other is that the radiation of electron and ions will cause damage to the chemical structure of the sedimentary film. As a quasi -neutral gas, its state is easily changed by changes in external conditions. The charged state on the surface of the substrate, the film attachment of the reactor wall, the fluctuation of the power supply, and the flow rate of the gas will change the type and quantity of the active particles, and the uniformity of the plasma is difficult to control, which will change the state of the substrate. In addition to the quality of ion bombardment and photon irradiation in plasma, in addition to affecting the quality of the sedimentary membrane, it will also affect the silicon base below. The corresponding research results of the spectrum show that the spectrum of the HIT battery has increased accordingly, and the spectrum is lower in the red light zone. This shows that the passivation effect of this layer improves the result of the blue light spectrum response, and for the damage inside the silicon wafer, the spectrum is reduced accordingly, and the quantum efficiency decreases. For this situation, the power of the plasma can be reduced, but it will also reduce the stability of the plasma. HWCVD prepares A-SI: H film heat wire chemical gas deposition HWCVD is a soft process that uses hot wires to catalyze and decomposes the gas. The sediment room can be convenient to convert from the laboratory to the production line. In the HIT battery, after 5 nanometers are sandwiched between the amorphous silicon launch pole and the crystal silicon, the defect density is lower than that of the ondex silicon film. The disadvantage of HWCVD is that the extension of the amorphous silicon can penetrate 5 nanometers and direct contact with crystal silicon. This will lead to high defects. The voltage will also be reduced. In preparation, controlling the temperature below 200 degrees can inhibit the extension of amorphous silicon. The improvement direction of the HIT battery process The interface passivation effect When the interface trap of amorphous silicon and crystal silicon rises from 1011 to 10-12 per square centimeter, the battery efficiency will be reduced by 20%. The passivation effect of this oste crystal silicon has deteriorated due to the existence of A-SI: H film. This may be the defects of the decree wave functions in the substrate through the ondex of the osmotic silicon and the A-SI: H film: H film: H film: H film: h thin film defect State interaction, this constitutes a composite passage for carriers. It can be used as a passivation layer because it has lower defect density and dark current. The luminous structure and surface cleaning use the sulfuric acid and hydrogen peroxide to oxidize the velvete surface layer, and then use a hydrofluoric acid with a concentration of 1%for 60 to 180 seconds. Reduce the effect close to polishing silicon. If the optimized design of the grid electrode can be removed by the grid line, and after an increase of 1.0, the efficiency can be increased by 1.6%. This depends on the studies of silver pulp and the improvement of silk net printing.

　　Why can't you charge the battery at low temperature?

　　Most materials such as lithium -ion batteries such as diaphragms and electrolytes are organic materials. The felting point boiling point is lower. If the temperature is too high, there will be some negative chemical reactions, which seriously affects the battery life and even safety performance.

　　Key materials for battery under low temperature conditions: the decrease in conductivity of positive, negative, electrolytes, etc., which leads to a decrease in conductive conductivity, which will seriously affect the battery life.

　　Low -temperature protection is that when the temperature is too low, the metal lithium in the battery will cause deposits, and no longer chemically reacts with the material. Essence

Read recommendations:

solar power station company

best solar generator for home backup

+85 Operating Lithium Battery Li Ion 18650 26650 Cell

Choosing the Right Panasonic 18650 Battery: NCR18650GA vs NCR18650B for Industrial Applications

Difference between primary battery and secondary battery